New Dektak
Make
Bruker/ Dektak XT
Model
Bruker/ Dektak XT
Facility Status
Working
Date of Installation
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded

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Category

  • Fabrication and Processing » Microfabrication

Booking Details

Booking available for
Internal and External Both

Facility Management Team and Location

Facility In Charge
Prof. Saurabh Lodha
Facility Manager
Dr. Deepti Rukade
Facility Operator
Ms. Shilpa
Facility Management Members
Prof. Saurabh Lodha, Prof. Udayan G, Prof. Swaroop Ganguly
Department
Electrical Engineering
Lab Email ID
query.iitbnf@gmail.com
Facility Location
Nanoelectronics Processing Lab (NanoE bldg, 1st floor)
Lab Phone No
022 2159 3552

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

The DektakXT stylus surface profiler is an advanced thin and thick film step height measurement tool. This tool can profile surface topography as well as measure surface roughness

Features Working Principle

Equipment compatible with 2”, 4”, 6” and 8’’ wafers 

 Stylus, LIS 3, 2um Radius- Type B 

 Scan length: upto 30 mm 

 Vertical resolution : less than or equal to 1 A˚ for 2 um vertical step

 Step height repeatability: 6A˚ or lower for a 1 um step 

 Stylus size: 2 um and 12.5 um 

 Capable of measuring samples: up to 50 mm thick 

 Field of view: 1 mm to 4 mm  Profile auto-leveling and stitching software

 Stylus force : 1mg-15mg

Body Specification

NA

Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures

Instructions for Registration

NA

Instruction for Sample Preparation

NA

User Instructions and Precautionary Measures

NA

Charges for Analytical Services in Different Categories

Usage Charges

To be decided

Applications

Step thickness measurement, stress measurement

Sample Details

Chemical allowed

NA

Allowed Substrate

Si, Ge, Glass, Sapphire

Substrate Dimension

NA

Target dimension

NA

Contamination remarks

No sticky and soft sample allowed.

Precursors/ Targets allowed

NA

SOP, Lab Policies and Other Details

Publications