Microwriter

External users: registration to be carried out only through I-STEM portal
Additional information about sample and analysis details should be filled in the pdf form provided in the I-STEM portal under “DOWNLOAD CSRF”

Internal users (IITB): registration to be carried out only through DRONA portal
Additional information about sample and analysis details should be filled in the pdf form provided here.

Make
Durham Magneto Optics LTD
Model
ML3
Facility Status
Working
Date of Installation
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded

.

Category

  • Fabrication and Processing » Microfabrication
  • Fabrication and Processing » Microfabrication

Booking Details

Facility Management Team and Location

Facility In Charge
Prof. Veeresh Deshpande
Facility Manager
Dr. Deepti Rukade
Facility Operator
Mr. Pankaj
Facility Management Members
Prof. Kasturi Saha, Prof. Veeresh Deshpande, Prof. Dipankar Saha
Department
Electrical Engineering
Lab Email ID
lwmw.nano@csif.iitb.ac.in
Facility Location
Micro 1 Yellow Room, IITBNF, EE Annex
Lab Phone No
022 2159 3552

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

The Microwriter ML 3 is a direct-write photolithography tool which can be used for direct writing on the substrate or mask writing.

Features Working Principle

The feature sizes (line/space) range from 2 μm (minimum) to 50 μm (maximum) for mask writing, and from 1 μm (minimum) to 50 μm (maximum) for direct writing.

Sample Preparation, User Instructions and Precautionary Measures

Instruction for Sample Preparation

NA

User Instructions and Precautionary Measures

NA

Charges for Analytical Services in Different Categories

Usage Charges

All charges are in INR/ hour

IITB Students TAIITB studentsIITB Monash studentsExternal AcademiaNational LabsSINE Start upResearch Park StartupResearch Park IndustryIndustry
25002500

2500 +18%GST

5000 +18%GST

12500 +18%GST

12500 +18%GST

12500 +18%GST

18750 +18%GST

25000 +18%GST

Applications

Lithography

Sample Details

Chemical allowed

Optical resists, S1813, LOR PPR

Allowed Substrate

Si, GaN, Diamond, Quartz

Gases allowed

NA

Substrate Dimension

2 inch 

Target dimension

NA

Contamination remarks

Samples with Na and K needs to be mentioned separately for dedicated usage of labware due to contamination issues

Precursors/ Targets allowed

NA

SOP, Lab Policies and Other Details

Training and Other Policy Documents
354_POLICY.pdf (3.83 MB)

Publications