Conductive atomic force microscope facility
Conductive atomic force microscope facility
Make
Asylum/Oxford Instruments
Model
MFP3D Origin
Facility Status
Not Working
Date of Installation
Facility Management Division
Institute Central Research Facilities (ICRF)

Category

  • Microscopy and Imaging » Force Microscopy

Booking Details

Booking available for
Internal and External Both
Available Mode for Use
Contact mode, Tapping mode, PFM, cAFM, MFM, KPFM, EFM, SThM

Facility Management Team and Location

Faculty In Charge
Prof. Udayan Ganguly, udayan@ee.iitb.ac.in, +91-22-2576-7698
Facility Operator
Shweta Nair, shweta_nair@iitb.ac.in, 8898413122
Co-convenors
Prof. Aparna Singh, MEMS
Prof. Dipti Gupta, MEMS
Prof. Ashwin Tulapurkar, EE
Prof. Suddhasatta Mahapatra, Physics
Prof. Shamik Sen, BSBE
Department
Electrical Engineering
LAB Email ID
cafm@iitb.ac.in
Facility Location
MCL Lab Second Floor, EE Annexe, Department of Electrical Engineering
Lab Phone No
8898413122

Facility Features, Working Principle and Specifications

Features Working Principle

Features:

  • Has a maximum scan area of 90x90 μm2 and minimum scan area is around 10 to 30nm. Maximum scan depth is 14μm and minimum can be a few nanometres
  • Good external noise isolation
  • High speed pulse measurement capability through tip
  • The sample preparation is minimum
  • It has a maximum Scan Area of 90 x 90 μm2 and minimum scan area determined by tip radius, which is around 10 to 30nm. Maximum Scan Depth is 14μm and minimum can be a few nanometres.
  • Good external noise Isolation.
  • It can measure localized IV using standard and custom waveforms though nano scale conductive tips.
  • High speed pulse measurement capability through tip is also added.

Working Principle:

IThe cAFM facility was installed in Electrical engineering department as a Central Facility as per RIFC norms. The facility is open for all IIT Bombay internal users to meet their research necessities.

The AFM consists of a nanoscale tip mounted on a cantilever that scans over the sample interacting with its force fields. The resulting deflections of the cantilever is converted into a laser beam deflections and it is used to map topography and morphology of samples. Additionally it can measure electrical, magnetic and piezo-electric behaviour of the surface using suitable probes.

Instructions for Registration, Sample Preparation, User Instructions, Precautionary Measures and Charges

Instructions for Registration

https://rnd.iitb.ac.in/sites/default/files/2024-03/Information%20and%20Revised%20charges%20for%20Internal%20and%20External%20Users%20using%20cAFM%20Facility.pdf

Instruction for Sample Preparation
  • Preferably samples size should be less than 2cm × 2cm. For CAFM measurements back contact or visible bottom contacts/ pads are required.

  • Max sample size permitted is 3cm * 3cm * 3cm. For better results, sample should be much smaller than the maximum sample size.

User Instructions and Precautionary Measures

Samples should be thin films, wet and powdered samples are not allowed.

Applications

 Material characterization applications including thin dielectric films, nanotubes,conductive polymers, and others Characterize ferroelectric and Piezoelectric materials, temperature control measurements.

Sample Details

Substrate Dimension

Preferably samples size should be less than 2cm × 2cm. For CAFM measurements back contact or visible bottom contacts/ pads are required.

SOP, Lab Policies and Other Details

SOP
S.O.P.pdf (600.96 KB)
Training and Other Policy Documents

Publications

Publications
NA