Atomic Layer Deposition system
Make
Veeco
Model
FIJI G2
Facility Status
Working
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded

.

Category

  • Fabrication and Processing ยป Nanofabrication

Booking Details

Booking available for
Internal

Facility Management Team and Location

Facility In Charge
Prof. Saurabh Lodha
Facility Manager
Dr. Deepti Rukade
Facility Operator
Ms. Anjum
Facility Management Members
Prof. Saurabh Lodha, Prof. Tanushree Chaudhary, Prof. Veeresh Deshpande
Department
Electrical Engineering
Lab Email ID
query.iitbnf@gmail.com
Facility Location
Nano lab,Ground Floor,IITBNF,EE Annex
Lab Phone No
022 2159 3552

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

The multi-material atomic layer deposition tool provides precision in depositing multi-material  thin films with atomic-level control with high uniformity, conformality, and thickness control

Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures

Instructions for Registration

https://www.iitbnf.iitb.ac.in/iitbnf/operation/lab-access-procedure.php

Instruction for Sample Preparation

NA

User Instructions and Precautionary Measures

Na

Charges for Analytical Services in Different Categories

Usage Charges

In progress

Applications

Thin films, gate oxides 

Sample Details

Chemical allowed

TMA

Allowed Substrate

Si, SiO2, Quartz

Gases allowed

NA

Substrate Dimension

1cm X 1cm upto 4 inch

Target dimension

NA

Contamination remarks

Samples having Na and K  not allowed 

Precursors/ Targets allowed

NA

SOP, Lab Policies and Other Details

Publications