External users: registration to be carried out only through I-STEM portal
Additional information about sample and analysis details should be filled in the pdf form provided in the I-STEM portal under “DOWNLOAD CSRF”
Internal users (IITB): registration to be carried out only through DRONA portal
Additional information about sample and analysis details should be filled in the pdf form provided here.
Make
Veeco
Model
FIJI G2
Facility Status
Working
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded
.
Category
- Fabrication and Processing » Nanofabrication
Booking Details
Slot Booking Link
Booking available for
Internal
Facility Management Team and Location
Facility In Charge
Prof. Saurabh Lodha
Facility Manager
Dr. Deepti Rukade
Facility Operator
Ms. Anjum
Facility Management Members
Prof. Saurabh Lodha, Prof. Tanushree Chaudhary, Prof. Veeresh Deshpande
Department
Electrical Engineering
Lab Email ID
query.iitbnf@gmail.com
Facility Location
Nano lab,Ground Floor,IITBNF,EE Annex
Lab Phone No
022 2159 3552
Facility Features, Working Principle and Specifications
Facility Description
Facility Description
The multi-material atomic layer deposition tool provides precision in depositing multi-material thin films with atomic-level control with high uniformity, conformality, and thickness control
Sample Preparation, User Instructions and Precautionary Measures
Instruction for Sample Preparation
NA
User Instructions and Precautionary Measures
Na
Charges for Analytical Services in Different Categories
Usage Charges
In progress
Applications
Thin films, gate oxides
Sample Details
Chemical allowed
TMA
Allowed Substrate
Si, SiO2, Quartz
Gases allowed
NA
Substrate Dimension
1cm X 1cm upto 4 inch
Target dimension
NA
Contamination remarks
Samples having Na and K not allowed
Precursors/ Targets allowed
NA