Make
AJA International
Model
Orion-8-CH1
Facility Status
Working
Date of Installation
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded
.
Category
- Fabrication and Processing » Nanofabrication
- Fabrication and Processing » Nanofabrication
Booking Details
Slot Booking Link
Booking available for
Internal
Facility Management Team and Location
Facility In Charge
Prof. Ashwin Tulapurkar
Facility Manager
Dr. Deepti Rukade
Facility Operator
Ms. Akanksha, Mr. Arpit
Facility Management Members
Prof. Ashwin Tulapurkar, Prof. Dipankar Saha, Prof. Saurabh Lodha
Department
Electrical Engineering
Lab Email ID
query.iitbnf@gmail.com
Facility Location
Nano 2 Lab, Ground floor, IITBNF,EE Annex
Lab Phone No
022 2159 3552
Facility Features, Working Principle and Specifications
Facility Description
Facility Description
Sputter deposition is a physical vapour deposition (PVD) method of depositing thin films by sputtering material from a 'target', then depositing it onto a 'substrate'. Magnetron sputtering applies a magnetic field around the target in order to energize argon atoms for bombarding the target.
Features Working Principle
Target Size: 2”
Gases used in the system: O2, Ar, PN2
Substrates used: Si,
Substrate size: Small samples, 2” and 4” diameter wafer.
Magnetic targets allowed
Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures
Instructions for Registration
https://www.iitbnf.iitb.ac.in/iitbnf/operation/lab-access-procedure.php
Charges for Analytical Services in Different Categories
Usage Charges
In progress
Applications
Thin film deposition, metal contacts
Sample Details
Chemical allowed
NA
Allowed Substrate
Si
Gases allowed
N2, O2
Substrate Dimension
2 inch to 4 inch
Target dimension
2 inch
Contamination remarks
Na and K not allowed