X-ray Diffractometer Facility
X-ray Diffractometer Facility
Make
Rigaku
Model
Smartlab
Facility Status
Not Working
Facility Management Division
Institute Central Research Facilities (ICRF)

Category

  • Diffraction » X-ray Diffraction

Booking Details

Slot Booking Link
Click here for Booking!
Booking available for
Internal and External Both
Available Mode for Use
Powder XRD Thin film XRD and GIXRD High temperature XRD X-ray reflectivity

Facility Management Team and Location

Faculty In Charge
Prof. Shaibal K. Sarkar
Co-convenors
Prof. Sagar Mitra
Prof. Subhabrata Dhar
Prof. Suddhasatta Mahapatra
Prof. Aswani Yella
Department
DESE
LAB Email ID
xrd@iitb.ac.in
Facility Location
Short circuit Lab (near powerhouse) IIT Bombay, Powai Mumbai 400076
Lab Phone No
02225764840

Facility Features, Working Principle and Specifications

Features Working Principle
  • X-Ray reflectivity measurement
  • In-situ electrochemical measurements (yet to be functional)
  • In-situ high temperature XRD measurement (yet to be functionsl
  • X-ray diffraction (XRD) is an instrumental technique to study crystalline materials. An X-ray beam is focused on the planes of the atoms forming the crystal lattice of the material under study. Of the incident beam, a part is transmitted, a part is absorbed, a part is refracted and scattered while the remaining part is diffracted. On diffraction of the x-ray beam from the sample, the distances between the planes of the atoms constituting the sample can be obtained by applying the Bragg's law. Bragg's law is given as nλ=2d sinθ, where n is the order of the diffracted beam, λ is the wavelength of the incident x-ray, d is the distance between adjacent planes of atoms and θ is the angle of incidence of the x-ray. With known values of λ and θ the d-spacings of the atoms in the sample can be calculated. The characteristic set of d-spacings and theirs intensity generated in a typical X-ray scan provides a unique "fingerprint" of the phases present in the sample. On proper interpretation with comparison with standard references available, the sample material can be identified from the respective "fingerprints" obtained.
Body Specification
  • X-Ray reflectivity measurement
  • In-situ electrochemical measurements
  • In-situ high temperature XRD measurement
  • Maximum rated output:                                   3 kW
  • Rated tube voltage-current:                            20-60 kV; 2-60 mA
  • Target:                                                             Cu
  • Focus Size:                                                     0.4 X 12 mm line/point
  • Radiation enclosure:                                       Full safety shielding with failsafe open/close mechanism
  • Scanning mode:                                              θ-2θ scan, 2θ scan
  • Optics:                                                             Incidence
  • optics:                                                              CBO 
  • Receiving optics:                                             Automatic variable scattering slit PSA
  • Detector:                                                         Scintillator NaI, Dtex

Instructions for Registration, Sample Preparation, User Instructions, Precautionary Measures and Charges

Instructions for Registration

Requirements

  • A table with glass cover for sample preparation
  • Few spatulas,tweezers,butter paper
  • Small spirit leveler
  • Inert gas cylinder for High temperature setup
  • Bottles for storing IPA
Instruction for Sample Preparation

Please follow the sample preparation methods below, according to the nature of your analysis.

For Powder XRD
Finely grained powders should be submitted. Powder samples having a minimum weight of 0.01g can be analyzed.

For Thin Film XRD and GIXRD
Sample size should be minimum 5mm X 5mm.

For High temperature XRD 
The powder samples should be mixed with a volatile solvent so as to form slurry. The slurry will then be drop casted on the sample holder.

For XRR
Thin films should be deposited on Si substrates. 

User Instructions and Precautionary Measures

Please follow the sample preparation methods below, according to the nature of your analysis.

  • For powder XRD, the sample quantity should be finely grained.
  • For High temperature XRD analysis, the user should be present during the analysis and the user should bring the necessary requisites to make the slurry out of his powder samples.
  • Measurement data will be given in CD format. Please bring your own CD.
  • Samples and Measurement data should be collected as soon as the analysis gets completed with a maximum of duration of one week.

Applications

  • Identification of unknown crystalline materials
  • Characterization of crystalline materials
  • Determination of crystal structures using Rietveld refinement
  • Thin film characterization
  • Determining thickness, roughness and density of thin films

Sample Details

SOP, Lab Policies and Other Details

Publications

Publications
NA