Make
ULTECH
Model
EURA-100
Facility Status
Working
Date of Installation
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)-IoE Funded
.
Category
- Fabrication and Processing ยป Nanofabrication
Booking Details
Slot Booking Link
Booking available for
Internal
Facility Management Team and Location
Facility In Charge
Prof. Udayan Ganguly
Facility Manager
Dr. Deepti Rukade
Facility Operator
Ms. Minita
Facility Management Members
Prof. Udayan Ganguly, Prof. Veeresh Deshpande, Prof. Apurba Laha
Department
Electrical Engineering
Lab Email ID
query.iitbnf@gmail.com
Facility Location
Nano 2 lab,Ground Floor,IITBNF,EE Annex
Lab Phone No
022 2159 3552
Facility Features, Working Principle and Specifications
Facility Description
Facility Description
The Plasma Asher tool used in semiconductor micro and nanofabrication for surface cleaning, material removal, and photoresist stripping through plasma ashing, a dry process that removes the organic materials from substrates.
Features Working Principle
NA
Body Specification
NA
Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures
Instructions for Registration
https://www.iitbnf.iitb.ac.in/iitbnf/operation/lab-access-procedure.php
Instruction for Sample Preparation
NA
User Instructions and Precautionary Measures
Na
Charges for Analytical Services in Different Categories
Usage Charges
In process
Applications
Descum
Sample Details
Chemical allowed
NA
Allowed Substrate
Si, SiO2, Diamond, GaN
Gases allowed
O2
Substrate Dimension
2 inch Si wafer
Target dimension
NA
Contamination remarks
Na and K samples not allowed
Precursors/ Targets allowed
NA