Facility picture
Make
Zeiss + NPGS
Model
Zeiss Sigma 300 & NPGS v9
Facility Status
Not Working

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Category

  • Fabrication and Processing ยป Nanofabrication

Booking Details

Available Equipment/ Mode of use
3 hour slots will be provided for Electron Beam Lithography. Spin coating, hot plate, Oxygen Plasma ashing are available for sample preparation prior to lithography. Development can be done under fume hood. All processes must be cleanroom compatible.

Facility Management Team and Location

Faculty In Charge
Kantimay Das Gupta (Phy) & Suddhasatta Mahapatra (Phy)
Co-convenors
K. Das Gupta
S. Mahapatra
Facility Operator
No dedicated operator. TAs can assist or user has to undergo training to work with own samples
Facility Management Members
K. Das Gupta
S. Mahapatra
Subhabrata Dhar
Dinesh Kabra
Anshuman Kumar Srivastava
Avradeep Pal
Arindam Chowdhury
Dipanshu Bansal
Balasubramanium Kavaipatty
Department
Physics
Lab Email ID
kdasgupta@iitb.ac.in
Facility Location
Department of Physics, Ground Floor

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

Zeiss sigma 300 SEM and NPGS pattern generation software are coupled together to make an Electron Beam Lithography system. Typically small samples of about 1 cm x 1 cm are handled.  The facility is not for full wafer writing.  The user will have to learn the basics of the NPGS system and write their own pattern using integrated QCAD software. 

Features Working Principle

Electron Beam sensitive resist (typically PMMA, HSQ) are coated on the sample using a spin coating system. The electron beam is programmed to write the desired pattern on the substrate using specified exposure doses. Pattern is then developed in suitable developer solution for the next phase of processing

Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures

User Instructions and Precautionary Measures

To be added

Charges for Analytical Services in Different Categories

Usage Charges

 

Industry

University

National Lab/R&D's

IIT Bombay Users

IIT Bombay TA's
Per sample
(Three Hour Slot) 		5000+gst1000+gst2500+gst500250

Applications

TBA

Sample Details

Chemical allowed

TBA

Allowed Substrate

Silicon, Gallium Arsenide, Glass, Sapphire, Quartz . No biological samples.

Gases allowed

not applicable

Substrate Dimension

1 cm x 1 cm approx. 

Target dimension

na

Contamination remarks

No biological samples

Precursors/ Targets allowed

NA

SOP, Lab Policies and Other Details

Publications