3dlitho
Make
Nanoscribe
Model
Photonic Professional (GT)
Facility Status
Working
Date of Installation
Facility Management Division
Institute Central Research Facilities (ICRF)

.

Category

  • Fabrication and Processing » Nanofabrication

Booking Details

Booking available for
Internal and External Both
Available Equipment/ Mode of use
1. Mesoscale fabrication of 3D/2D structures on ITO-coated glass substrates/Si wafer using the resist IP-S.
2. Nanoscale fabrication of 3D structures on Borosilicate coverslips using the resist IPL-780
3. Nanoscale fabrication of 3D structures on Fused silica using the resist IP-DIP

Facility Management Team and Location

Faculty In Charge
Prof. Prakriti Tayalia
prakriti@iitb.ac.in
91-22-2576 7797
Facility Operator
Ms. Saranya Ajesh
022-2576-6746
3dlitho@iitb.ac.in / lithography3d@gmail.com
Facility Management Members
1. Prof. Shamik Sen (BSBE)
2. Prof. Samir K. Maji (BSBE)
3. Prof. Prasanna S Gandhi (Mechanical Engineering)
4. Prof. Sameer Ralph Jadhav (Chemical Engineering)
Department
Biosciences and Bioengineering
Lab Email ID
3dlitho@iitb.ac.in
Facility Location
Central Instrumentation Room, Ground Floor, Bio-Sciences & Bio-Engineering Department
Lab Phone No
022-2576-6746

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

The 3D Laser Lithography is a 3D printer based on two-photon polymerization (2PP) and designed for ultra-precise and rapid nano and microfabrication. It combines flexibility in design with straightforward operation. Therefore, it is an ideal instrument for science and prototyping in multi-user facilities and research laboratories.

A Phenom tabletop Scanning Electron Microscope (SEM) is available for inspecting printed structures. Internal users can access the SEM by submitting a slot request through Drona, with the request form provided alongside the 3D Lithography facility.

Features Working Principle

Lateral feature size: 200nm

Lateral resolution: 500nm

Working Principle:

3D Printing uses Two-Photon Polymerization (2PP) technology to fabricate three-dimensional micro and nanostructures using photo-sensitive materials based on direct laser writing.

A necessary condition for two photons of near-infrared light being absorbed simultaneously is a sufficiently high light intensity that is provided by a femtosecond pulsed laser beam. Typically, the laser is focused on the resin, and two-photon polymerization (2PP) is triggered only in the focal spot volume, where the light intensity exceeds a polymerization threshold. The resin is otherwise transparent to the wavelength of the photons.

The smallest printable 3D volume is termed a voxel, which is analogous to a 2D pixel. Moving the laser focus along a trajectory in all three dimensions enables the printing of structures built from multiple voxels and printed lines. This technology enables the printing of structures with small, medium, and large feature sizes in 3D as well as 2D patterns.

Instructions for Registration, Sample Preparation, User Instructions and Precautionary Measures

Instructions for Registration

For Internal Users:

Only online registration via the Drona IRCC website will be accepted. Users should email their designs to 3dlitho@iitb.ac.in  or lithography3d@gmail.com

For External Users:

The user can send an email to the following email id for assistance. 

 3dlitho@iitb.ac.in  or lithography3d@gmail.com

The external user request form is provided below:- 

https://rnd.iitb.ac.in/sites/default/files/2024-03/External%20users%20form-converted.pdf

Instruction for Sample Preparation
  •  The design should be emailed to 3dlitho@iitb.ac.in in STL format to assess its feasibility and calculate the fabrication charges.
  • Charges will be determined based on the fabrication time required for the structure. 
  • The resin and substrate will be supplied. 
  • External users can refer to the "User Instructions" document for details on charges and payment information.

Charges for Analytical Services in Different Categories

Applications

  • Life sciences

  • Microfluidics

  • Microoptics

  • Integrated photonics

  • Materials engineering

  •   Micromechanics and MEMS

Sample Details

Allowed Substrate

Currently, the 3D lithography system is optimized for the following substrates only:

  • Borosilicate glass coverslips of 30mm diameter, for nano-level printing.

  • Fused silica substrates of 25 X 25mm and thickness of 0.7mm for nano-level printing.

  • ITO-coated glass substrates of 25 X 25mm and thickness of 0.7mm for micro-level printing

  • Si wafer 2" and 5" for micro-level printing

Substrate Dimension
  • ITO-coated glass - 25mm X 25 mm X 0.7mm, Resistivity 100 Ohms
  • Fused silica substrates of 25 X 25mm and thickness of 0.7mm
  • Borosilicate coverslips - 30mm diameter, 170um thickness 
  • Si wafer - 2" or 5"

SOP, Lab Policies and Other Details

Publications

  1. Sweta Rani, Arun Jaiswal, Rahul Kumar Das, Gaurav Pratap Singh, Ajinkya Palwe, Sumit Saxena, Wenlong Cheng, and Shobha Shukla*. “Fabrication of All-dielectric, 3D Chiral Metamaterial Using Two-photon Lithography”. Frontiers in Optics + Laser Science 2023 (FiO, LS) Technical Digest Series (Optica Publishing Group, 2023), paper JM7A.6
  2. Sweta Rani, Arun Jaiswal, Rahul Kumar Das, Gaurav Pratap Singh, Ajinkya Palwe, Sumit Saxena, Wenlong Cheng, and Shobha Shukla*. “Femtosecond-Laser Assisted Fabrication of Two-Dimensional Photonic Crystal Slab”. Technical Digest Series (Optica Publishing Group, 2023), paper JM7A.37
  3.   Pillai MM, Ajesh S, Tayalia P*. “Two-photon polymerization based reusable master template to fabricate polymer microneedles for drug delivery”. MethodsX2023. 102025, ISSN 2215-0161.
  4.  Indian patent application no.202221036495- “A method of producing a template and negative mold for microneedle array” filed on 24 June 2022.