External users: registration to be carried out only through I-STEM portal
Additional information about sample and analysis details should be filled in the pdf form provided in the I-STEM portal under “DOWNLOAD CSRF”
Internal users (IITB): registration to be carried out only through DRONA portal
Additional information about sample and analysis details should be filled in the pdf form provided here.
.
Category
- Microscopy and Imaging » Electron Microscopy
Booking Details
Facility Management Team and Location
Facility Features, Working Principle and Specifications
Facility Description
Model: JSM- IT 800(SHL)
Resolution: 0.5nm at 15kV
0.7nm at 1kV
Accelerating Voltage: 0.01 to 30kV
The JSM-IT800 incorporates “In-lens Schottky Plus field emission electron gun" for high resolution imaging and an innovative electron optical control system "Neo Engine" with high and low vacuum mode.
The integrated In-Lens Schottky Plus and low aberration condenser lens achieves high beam brightness. Ample probe current (100nA@5kV) is available even at low accelerating voltage. This allows the user to perform high resolution observation, high speed elemental mapping, EBSD analysis and Soft X-ray analysis with minimal adjustment of SEM parameters.
It is equipped with multiple detectors such as Secondary Electron detector, Variable back-scattered detector, Upper Hybrid Detector, Upper Electron Detector which helps to observe variety of materials. Instrument has an attachment of Ultim Max 6.5 EDS and Symmetry S2 EBSD which delivers data with high speed without compromising quality. Aztech sofware has a unique feature of live chemical imaging along with routine point/Area Analysis and mapping.
None
Sample Preparation, User Instructions and Precautionary Measures
- Facility is available for microscopic examinations only, and the sample preparation (including sputtering/electropolishing) is not under scope of this facility usage. It is solely the user’s responsibility to come up with a well-prepared sample(s).
- Sample dimensions will be 10mmX10mmX10mm max if you wish to do multiple samples at a time
- The samples should be dry and should withstand ultra-high vacuum
- Samples leaving loose particles will not be entertained.
- Please mention in the request form if your samples needs special handling.
- It is mandatory for the user to acknowledge CSIF- IoE funded Dual Vacuum HR SEM facility at Dept. of Metallurgical Engineering and Materials Science, IIT Bombay, in their publications and thesis and communicate the same to the laboratory.
- The user should be present at the time of the slot
- Slots will be provided as per the queue.
- The slot cancellation/ postponements by e-mail intimation only and at least one day in advance.
- Please note that only one request will be accepted at a time and after the completion only you may apply for the next one.
Charges for Analytical Services in Different Categories
No. | Category | Charge ratio. | GST @ 18% | SEM | SEM+EDS/AFA |
SEM+EBSD | SEM+EDS+EBSD | |
1. | IITB (TAs) | X/2 | No GST | 300 | 400 |
500 | 600 | |
2. | IITB Students | X | No GST | 600 | 800 | 1000 | 1200 | |
3. | IITB-Monash Students | X | + GST | 600 | 800 | 1000 | 1200 | |
4. | Academic Institutes | 2X | + GST | 1200 | 1600 | 2000 | 2400 | |
5. | National Labs | 5X | + GST | 3000 | 4000 | 5000 | 6000 | |
6. | Sine (letter from SINE reqd.) | 5X | + GST | 3000 | 4000 | 5000 | 6000 | |
7. | Research Park (MSME) (letter from RP reqd.) | 5X | + GST | 3000 | 4000 | 5000 | 6000 | |
8. | Research Park (Big Industry partners) (letter from RP reqd.) and MSME not associated with RP (appropriate certificate required) | 7.5X | + GST | 4500 | 6000 | 7500 | 9000 | |
9. | Industries | 10X | + GST | 6000 | 8000 | 10000 | 12000 | |
Note:
The above-mentioned rates are on per hour basis. The charges may
Be revised as and when required.
Please note that the above charges are exclusive of GST @18% at the moment and shall be charged extra for external users.
Facility is available for the microscopic examination only, and the sample preparation (including sputtering/electropolishing) is not under the scope of this facility usage. It is solely the user’s responsibility to come up with a well -prepared sample(s).
Data Analysis is also not under the scope of the facility usage, and hence, the analysis is the responsibility of the end user.