• High resolution microstructural characterization of thin films
  • ω-scan/Rocking curves [RC]
  • High resolution ω-2θ using analysers (two bounce or four bound analyser in the diffraction beam optics) [HRω-2θ]
  • Reciprocal space mapping [RSM]
  • ϕ-scan
• Reflectivity
  • Reflectivity measurement [Reflectivity]
• High Resolution powder measurements
  • θ-2θ using Johnson mirror [HR-powder]
  • Glancing angle diffraction [GLD]
• In-plane measurements
  • ϕ-scan/rocking curves [In-RC]
  • 2θx-ϕ scan
• High intensity x-ray source (9 kW rotating anode source)i
• Parallel beam optics. (useful for microstructural characterization)
• High resolution goniometer with △θ ▯ 0.0001 Deg as compared to 0.001 Deg for the standard XRD systems.
• In-plane goniometer (useful for in-plane microstructural studies for the thinfilms)

X-ray beam is allowed to fall on the sample and the angles (θ) associated with diffraction maxima [as well as intensity distribution about the maxima] occurring due to different lattice planes are recorded. (θ) is related to the lattice spacing d through Bragg condition 2d Sinθ=nλ where λ is the x-ray wavelength. Information about the lattice structure as well as crystalline quality of a material can be obtained by measuring the angular distribution of intensity about the maxima.