Nanoscribe High precision 3D printer

External users: registration to be carried out only through I-STEM portal
Additional information about sample and analysis details should be filled in the pdf form provided in the I-STEM portal under “DOWNLOAD CSRF”

Internal users (IITB): registration to be carried out only through DRONA portal
Additional information about sample and analysis details should be filled in the pdf form provided here.

Make
Nanoscribe
Model
Photonic Professional (GT)
Facility Status
Working
Date of Installation
Facility Management Division
Centre for Sophisticated Instruments and Facilities (CSIF)

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Category

  • Fabrication and Processing » Microfabrication
  • Fabrication and Processing » Nanofabrication

Booking Details

Booking available for
Internal and External Both
Available Equipment/ Mode of use
1. Mesoscale fabrication of 3D/2D structures on ITO-coated glass substrates/Si wafer using the resist IP-S.
2. Nanoscale fabrication of 3D structures on Borosilicate coverslips using the resist IPL-780
3. Nanoscale fabrication of 3D structures on Fused silica using the resist IP-DIP

Facility Management Team and Location

Facility In Charge
Prof. Prakriti Tayalia
prakriti@iitb.ac.in
91-22-2576 7797
Facility Operator
Ms. Saranya Ajesh
022-2576-6746
3dlitho@iitb.ac.in / lithography3d@gmail.com
Facility Management Members
1. Prof. Shamik Sen (BSBE)
2. Prof. Samir K. Maji (BSBE)
3. Prof. Prasanna S Gandhi (Mechanical Engineering)
4. Prof. Sameer Ralph Jadhav (Chemical Engineering)
Department
Biosciences and Bioengineering
Lab Email ID
3dlitho@csif.iitb.ac.in/ 3dlitho@iitb.ac.in
Facility Location
Central Instrumentation Room, Ground Floor, Bio-Sciences & Bio-Engineering Department
Lab Phone No
022-2576-6746

Facility Features, Working Principle and Specifications

Facility Description

Facility Description

The 3D Laser Lithography is a high-resolution 3D printer based on two-photon polymerization (2PP) and designed for ultra-precise and rapid nano and microfabrication. It combines flexibility in design with straightforward operation. Therefore, it is an ideal instrument for science and prototyping in multi-user facilities and research laboratories.

Lateral feature size: 200nm

Lateral resolution: 500nm

Working Principle:

3D Printing uses Two-Photon Polymerization (2PP) technology to fabricate three-dimensional micro and nanostructures using photo-sensitive materials based on direct laser writing.

A necessary condition for two photons of near-infrared light being absorbed simultaneously is a sufficiently high light intensity that is provided by a femtosecond pulsed laser beam. Typically, the laser is focused on the resin, and two-photon polymerization (2PP) is triggered only in the focal spot volume, where the light intensity exceeds a polymerization threshold. The resin is otherwise transparent to the wavelength of the photons.

The smallest printable 3D volume is termed a voxel, which is analogous to a 2D pixel. Moving the laser focus along a trajectory in all three dimensions enables the printing of structures built from multiple voxels and printed lines. This technology enables the printing of structures with small, medium, and large feature sizes in 3D as well as 2D patterns.

 

Features Working Principle

A Phenom tabletop Scanning Electron Microscope (SEM) is available for inspecting printed structures. Internal users can access the SEM by submitting a slot request through Drona, which includes a request form provided alongside the 3D Lithography facility.

The Thermo Scientific Phenom ProX Scanning Electron Microscope (SEM) is based on the 5th-generation Phenom desktop SEM platform and is a high-performance SEM for imaging and analysis. It offers a serious alternative to floor model SEMs in applications that include materials science, industrial manufacturing, electronics, earth science, life sciences, education, and more.

  • Make and Model Phenom ProX SEM 
  • Specifications / Features : 
  1. Magnification range- 200x – 20,000x 
  2. Accelerating Voltage: 5kV to 15 kV 
  3. Image formats- JPEG/ TIFF 
  4. Image resolution options- up to 2048 x 2048 pixels 
  5. Sample stage- Computer-controlled motorized X and Y 
  6. Detector - Backscattered electron detector (BSD) 
  7. Sample size – up to 10mm (Ø), up to 5mm (h)
  8. Powdered or wet samples are not allowed 

Sample Preparation, User Instructions and Precautionary Measures

Instruction for Sample Preparation

For SEM analysis

  • The sample size should not exceed 10mm (Ø), up to 5mm (height)
  • Powdered samples are not allowed for SEM.
  • Samples should be dried properly; wet samples are not allowed for SEM.

Charges for Analytical Services in Different Categories

Usage Charges

Charges for using 3D Laser Lithography Facility

 

S.

No.

 

Usage

 

IITB

Users (Rs.)

External Academic Institutions

NationalLabs and R&D Organizations

 

Users from Industry

1

Equipment usage fee

500

1500

2000

5000

2

3D designing charges

500

1500

2000

5000

3

2D structure(1 cm2)

250

750

1000

2500

4

2D structure with SEM

(1 cm2)

450

1350

1800

5000

5

3D structure (height up to 300 um)

500

1500

2000

5000

6

3D structure with SEM

(height up to 300 um)

700

2100

2800

7500

7

3D structure (height up to 1 mm)

1500

4500

6000

15000

8

3D structure with SEM

(height up to 1 mm)

1700

5100

6800

17500

9

Hourly fee if fabrication takes longer than 1 hour

500

1500

2000

3000

Charges for using ScanningElectron Microscope Facility

Imaging

250 / sample

700 / sample

1500 / sample

2500 / sample

Additional charges:

  • 18% GST

  • Substrate charge: Rs. 500/- per substrate (for 3D Laser Lithography)

  • Charges for optimizing writing parameters - Substrate cost plus writing cost on an hourly basis (excluding usage fee) (for 3D Laser Lithography)



 

Applications

Applications of the 3d Laser Lithography Facility:-

  • Life sciences

  • Microfluidics

  • Microoptics

  • Integrated photonics

  • Materials engineering

  •  Micromechanics and MEMS

Applications of the SEM Facility:-

  • Materials Science/Metallurgy
  • Dental and medical 
  • Corrosion  
  • Polymer Science 
  • Energy Science/Engg. 
  • Biological and life sciences 
  • Semiconductors
  • Civil and Earth Sciences
  • Nanotechnology
  • Ceramics
  • Pharmaceuticals

 

 

Sample Details

Allowed Substrate

Currently, the 3D lithography system is optimized for the following substrates only:

  • Borosilicate glass coverslips of 30mm diameter, for nano-level printing.

  • Fused silica substrates of 25 X 25mm and thickness of 0.7mm for nano-level printing.

  • ITO-coated glass substrates of 25 X 25mm and thickness of 0.7mm for micro-level printing

  • Si wafer 2" and 5" for micro-level printing

Substrate Dimension
  • ITO-coated glass - 25mm X 25 mm X 0.7mm, Resistivity 100 Ohms
  • Fused silica substrates of 25 X 25mm and thickness of 0.7mm
  • Borosilicate coverslips - 30mm diameter, 170um thickness 
  • Si wafer - 2" or 5"

SOP, Lab Policies and Other Details

Publications

  1. Sweta Rani, Arun Jaiswal, Rahul Kumar Das, Gaurav Pratap Singh, Ajinkya Palwe, Sumit Saxena, Wenlong Cheng, and Shobha Shukla*. “Fabrication of All-dielectric, 3D Chiral Metamaterial Using Two-photon Lithography”. Frontiers in Optics + Laser Science 2023 (FiO, LS) Technical Digest Series (Optica Publishing Group, 2023), paper JM7A.6
  2. Sweta Rani, Arun Jaiswal, Rahul Kumar Das, Gaurav Pratap Singh, Ajinkya Palwe, Sumit Saxena, Wenlong Cheng, and Shobha Shukla*. “Femtosecond-Laser Assisted Fabrication of Two-Dimensional Photonic Crystal Slab”. Technical Digest Series (Optica Publishing Group, 2023), paper JM7A.37
  3.   Pillai MM, Ajesh S, Tayalia P*. “Two-photon polymerization based reusable master template to fabricate polymer microneedles for drug delivery”. MethodsX2023. 102025, ISSN 2215-0161.
  4.  Indian patent application no.202221036495- “A method of producing a template and negative mold for microneedle array” filed on 24 June 2022.